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Tungsten Chemical Etching
Tungsten chemical etching is ideal for a variety of military, aerospace, medical, telecommunications, and electronics applications.
Tungsten, or Wolfram, is a free element known for its remarkable robustness and high melting point. In its raw form, it is a hard steel-grey metal that is often brittle and hard to work.
Tungsten Chemical Etching
Tungsten has many alloys for a variety of applications including military applications in penetrating projectiles.
Fotofab’s chemical etching process produces designs that can withstand harsh indoor and outdoor environments. The process uses an acid (Ferric Chloride) to etch the unprotected parts of a metal surface to create a design or image formed to your project’s specifications.
Characteristics of Tungsten
- High melting point of 3,422°C (6,192°F)
- High boiling point of 5,930°C (10,710°F)
- Low vapor pressure at temperatures above 1,650°C (3,000°F)
- Low coefficient of thermal expansion
- High tensile strength
Certifications
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Tungsten Chemical Etching Applications
Half of all Tungsten is consumed to produce hard materials–namely Tungsten Carbide–with the remaining major use being in alloys and steels for a variety of applications in aerospace, medical, telecommunications, and electronics, including:
- Lighting filaments
- Electrical and electronic contacts
- Radiation shielding
- Wear-resistant parts and coatings
- Integrated circuits
- Field emission guns
Other Factors
- If made very pure, Tungsten retains its hardness (which exceeds that of many steels), and becomes malleable enough that it can be worked
- It is worked by forging, drawing, or extruding, but more commonly formed by sintering
- Alloying small quantities of Tungsten with steel increases its toughness